Metal-Coordination ALD Precursors & ALD Thin-Film Deposition
■ Technology Introduction
A series of functional acrylate monomers have been developed which apply to semiconductor and
opto-electronic industry.
DUV lithography platform
■ Technology Introduction
The compositions of photoresist including monomer of photoresist, polymer of photoresist,
photoacid generator, surfactant, and the formulation of photoresist are able to be verified by
the DUV lithography platform.
■ Contact Us
Material and Chemical Research Laboratories
Dept. of Front-End Semiconductor Materials
and Applications(L700)
Pao Yu-Chieh
Tel:03-5916868
E-mail:YC-Pao@itri.org.tw