Carbon Capture Technology & Highly Effective Automatic Microreactor System & Acid-Base Washing and Dust Removal via HiGee Technology & Thinner Reclaim System of LCD Panel Plant

  • 字級

Carbon Capture Technology

■ Technology Overview
• Establish carbon capture technology by chemical absorption with formulated high-efficient absorbent and optimized operation parameters with computer modeling allowing energy consumption to be less than 3GJ/tCO2
• The desorbed high purity CO2 (>99.9%) can be utilized in the production of dry ice, electronic grade CO2 as well as low carbon chemicals such as methane, methanol and dimethyl carbonate
• The flue gas pretreatment has utilized a unique absorbent to remove the H2S and reduce the SO2 concentration below 1ppm
 
■ Implemented Fields
• Coal-fired power plant/boiler
• Petroleum/cogeneration plant
• Steel mill
Carbon Capture Technology
 

Highly Effective Automatic Microreactor System

■ Technology Overview
• Be beneficial for high-speed mixing and high heat transfer performance, narrowed distribution for reactants’ residence time, repeatability, and quick process response than the traditional batch reactor
• An easy-operate unit that rarely has the scaling-up effect and with fewer residues remaining
 
■ Features
• The designed novel micro channel reaction apparatus makes the reaction rate 3 to 8 times the origin (US10537869B1, TW202023679A)
• An application on continuous extraction is operated near the thermodynamic limit (TW202228831A, US patent pending)
Highly Effective Automatic Microreactor System
 
■ Applications
• In Tadalafil synthesis, the reaction time had been shortened to 60 times, and byproduct had reduced by around three times
• In p-toluene-sulfon-amide (PTSA) synthesis, the yield had been enhanced by around 10~15%
• The product purity is greater than 98% in manufacturing the active pharmaceutical ingredients of triglyceride-lowering medicine
• Optical-activity medicine synthesizing. The conversion is raised from 20.5 to 80.6%; purity is increased from 56.1 to 76.6%
• Shortcut the hydrogenation reaction time to 7 minutes (4 hours for origin)
 

Acid-Base Washing and Dust Removal via HiGee Technology

■ Technology Overview
• A technology with a more extensive interfacial area that results in water-soluble contents could be rapidly and effectively removed
• Allows liquid to be repeatedly used with an automatic adjustment function on absorbent
 
■ Features
• Simultaneously pull out particles, water-soluble organics, and acid (or base) compounds
• No risk of being stuck by particles!
• Lower occupied space to 50% than others (e.g., wet dust collector)
• High flexibility in operation, reusable absorbent, and high removal efficiency under low pollution feed
• Removals of PM2.5 and PM10 are greater than 95% and close to 100%, respectively
Acid-Base Washing and Dust Removal via HiGee Technology
 

Thinner Reclaim System of LCD Panel Plant

■ Background
• A massive amount of waste solvents (about 20K ton/yr in Taiwan) has been generated in LCD panel processes; the recovery & purification of the thinner from those wastes are difficult due to photoresist and multi-component
• Besides, the outsourced treatment charges a higher fee and usually gets poorer recovery quality
• Existing TRS with a low recovery rate that leads to the recovered thinner could only be downgraded applications

■ Implementation of ITRI-MCL's Technology

Thinner Reclaim System of LCD Panel Plant

 
■ A Commercial Case
• ITRI’s patented high-efficiency DWC (Dividing-Wall Column) distillation technology, energy-saving equipment with lower hardware investment and less land occupied, was applied
• The distillation facility has been operated since 2021; the annual recycled amount is 6500 tons. The recovery rate has increased from 45% to 90%
• The recovered quality is better than the electronic grade and is again utilized in the panel-making process
• The by-product containing multi-solvents is sold for other industrial applications
 

Industrial Technology Research Institute (ITRI)
 
Material and Chemical Research Laboratories (MCL)
Dept. of Pilot Process & Applications (T200)

 

相關文件:2023MCL-e-T200.pdf

分享