▣ Low Process Temperature and High Resolution Photosensitive Polyimide (PSPI)
■ Features
The developed photosensitive polyimide (PSPI) can be processed under 200℃ and applied to both broadband UV system and Digital Lithography Technology (DLT) @405nm. The resolution of PSPI achieves L/S=2/2μm.
■ Applications
Low Dk materials, Micro/Mini LED, Printed circuit board (PCB) and semiconductor.
▣ Atomic Layer Deposition (ALD) Precursors
■ Features
A series of atomic layer deposition (ALD) precursors with high vaporization rate and high reactivity are developed. By utilizing plasma enhanced ALD tool to conduct deposition, a thing film with high uniformity and step coverage can be produced.
■ Applications
GaN and AlN in HEMT device, EMI shielding layer, high k dielectric, other semiconductor materials.
Industrial Technology Research Institute (ITRI)
Material and Chemical Research Laboratories (MCL)
Dept. of Front-End Semiconductor Materials and Applications (L700)