Integrated Chemical Analysis Application Service Platform
■ Technical introduction
The integrated chemical analysis and application laboratory has a comprehensive optical spectrum, mass spectrometry, material property analysis service and expert analysis system. According to the 4 core technologies of“special chemical analysis”, “material composition analysis”,“failure analysis”,“water quality and online detection service”established by our laboratory. This allows us services can be cover the materials, plastics, petrochemicals, semiconductors, green energy, biotechnology and pharmaceutical industries. The integrated analysis and application service platform has wealthy experience in industrial service and customization capabilities, and accelerates the value-added of industrial products and the challenge of market opportunities.
■ Service features
▶ Precious metal recovery verification service.
▶ Chemical composition analysis.
▶ Development of screening reagent.
▶ High-purity chemical validation and failure analysis.
▶ Water quality integrity validation and analysis.
▶ Online system integration and development.
Water Quality Integrity Verification Analysis
ITRI water quality analysis platform provides customized consulting services to give you a deeper understand of your water quality.
▶ Sample pretreatment
● Customized sample enrichment.
▶ Organic matter analysis
● TOC.
● LC-OCD、GPC-UV(Organic matter composition in water)
● LC-UV/HRMS、GC-HRMS(analysis of unknown compounds, solvent, PFAS, emerging pollutants…)
▶ Inorganic element analysis
● ICP-OES/ ICP-MS(As, Cd, Hg, B, Pb, Al, As, Ba…)
▶ Ionic species analysis
● IC(Anion: F-, Cl-, Br-, NO3-, PO43-, SO42-...；cation: Na+, K+, NH4+, Ca2+, Mg2+...)
Electronics Specialty Chemicals Product Development Application
■ Technical introduction
Our research laboratory has developed a non-toxic, ammonia-free, green photoresist stripper that meets low COD specifications and reduces wastewater treatment burdens. By control the surface tension and photoresist expansion, the stripper can reduce photoresist residue in fine-linewidth substrate processes(L/S<10μm/10μm). Compared to traditional strippers, it accelerates stripping time by 30% and increases lifetime by 50%, reducing process raw material and equipment maintenance costs.
■ Service features
▶ PCB field
● Photoresist accelerated stripper.
● Removal agent for film and ink processing.
● Micro-etching solution.
▶ Semiconductor field
● NMP/DMSO-free strippers.
● Process line descaling agents.
● Developers.
■ Contact Us
Material and Chemical Research Laboratories
Dept. of Integrated Chemical Analysis and Application(M600)
Jie-Bi Hu
Tel:03-5916938
E-mail:jiebihu@itri.org.tw